GM200/300S is low cost tool designed to detect metal residue tungsten or copper post CMP.
The tool can used as standalone or integrated.
- Designed to operate in clean room class 1
- Small foot print: 80X90 cm
- 100% inspection of the wafer area
- Identifies metal remaining greater then 25X25u on the front size of the wafer
- In the integrated version: no impact on the performance host tool throughput
- 24/7 operating time
- Tool designed and operates according to the semi regulations
- Secs/Gem Interface
- Fast handler and smart image processing allow throughput up to 160wph in the standalone version.
- Improve yield
- Low cost and very short ROI